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Home > APPLICATIONS > Cleaning & Sterilization

Cleaning & Sterilization

洗浄・除菌関連

Fine bubbles are used for cleaning and sterilization of industrial products and foods.

Fine bubbles are negatively charged and gather positive (+) substances. The cleaning power is enhanced by several effects fine bubbles have such as; the effect of degreasing, the effect of peeling off deposits by entering between the deposits and the cleaning object, and the force and shock waves when the bubbles burst.

One of the great effect of fine bubbles is a very high detergency. This cleaning mechanism is considered to be as follows.
In the cleaning of contaminants adhering to the surface of silicon wafers, when using an ultrapure water jet containing UFB (ultra-fine-bubbles / nanobubbles), the force and shock waves at the time of bubbles burst dramatically enhance the cleaning power.

Fine bubbles have a degreasing effect of separating and removing the oil as they permeate the oil and permeate between the boundary with the adhering surface. Also, it can penetrate into the narrow space between the objects that are in close contact with each other, and as the nano-sized bubbles coalesce into microbubbles, which can act as wedges to separate them. These characteristics enhances detergency. This can be used for numerous solutions and is currently used for home baths / showers, dishwashing, and cleaning of machine parts.

It also has a high sterilization effect. Not only the bacteria attached to the surface, but also the fine bubbles permeate the body of the shrimp and sterilize them, and nearly 90% of the bacteria have been successfully sterilized with the fine bubbles using tap water and atmospheric air.

 

Cleaning experiment

The result of cleaning silicon wafer using ultra-fine-bubbles

After ultra-pure water jet cleaning

超純水ジェット洗浄後10
1000 magnification
超純水ジェット洗浄後1
3000 magnification

After ultra-pure water + ultra-fine-bubble jet cleaning

超純粋ジェット洗浄後+ウルトラファインバブル洗浄後10
1000 magnification
超純粋ジェット洗浄後+ウルトラファインバブル洗浄後
3000 magnification

Effect of cleaning

  Before cleaning After ultra-pure water cleaning  After ultra-pure water + ultra-fine-bubble jet cleaning 
      picture of 1000 magnification picture of 3000 magnification
Square measure  359~472um2 320~482um2 28.65um2 37.33um2
  Cleaning rate due to UFB : 92. 13% as area ratio    

Experimentally verified the effect of removing fine particles on the solid surface by pressure waves, utilizing the characteristic that the inside of ultra-fine-bubbles become high pressure.
It became clear that the fine particles over 1 micron were removed and no longer observed, and the ratio of the area that could be washed reached 92%.

Mechanism of cleaning silicon wafer(PDF)

Application example related to cleaning & sterilization

Using fine bubbles for super-clear mirror surface polishing of silicon wafer

Easily achieved the required mirror surface!!

シリコンウエハーの超超鏡磨加工● Fine bubbles were used to solve the problem because even though several types of measures were taken, the required super-clear mirror surface could not be achieved.

● OK nozzles are installed in the middle of the grinding fluid piping.

● We received words of gratitude from this company saying, “We are very pleased to be able to supply accepted products.”

● The cutting edge of the grindstone was always secured by the impact of the burst of the fine bubbles, and also the ground cutting chips were cleaned to obtain the required surface quality.


APPLICATIONS

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  • Machine Tools
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  • Residential Use
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Loop Flow OK Nozzle
OK Engineering Co.,Ltd.

102 Grace Terada-cho
9-8, Kokubu-cho,
Tennoji-ku, Osaka-City,Osaka, Japan
543-0044

web@oknozzle.com

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Loop Flow OK Nozzle

102 Grace Terada-cho
9-8, Kokubu-cho,
Tennoji-ku, Osaka-City,Osaka, Japan
543-0044

web@oknozzle.com

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